Influence of hot filaments arranging on substrate temperature during HFCVD of diamond films

摘要

The substrate temperature distribution during hot filaments chemical vapor deposition (HFCVD) of diamond films was stimulated. Results showed that the substrate temperature varied with the space position. A temperature distribution with the periodic fluctuation that is in accordance with the filaments arranging occurred. An optimum homogeneous temperature substrate position available for the growth of diamond films over a large area existed in the space with 6-8 mm away from the filaments arranging plane The substrate temperature was influenced by filaments diameter and distance between filaments. The substrate temperature increased with the filaments diameter, but the temperature distribution was not changed. The parallel arranging of the filaments with a 10-mm distance between filaments has a lower temperature fluctuation and larger uniform temperature areas for diamond film growth. A more effective way to enlarge the growth areas of the diamond films was to increase the quantity of the arranged filaments with a proper distance between them.