首页> 外国专利> A Method for Depositing Diamond Films Without Fracture by a Control of Substrate Temperatures Using Powders

A Method for Depositing Diamond Films Without Fracture by a Control of Substrate Temperatures Using Powders

机译:通过使用粉末控制衬底温度来沉积不破裂的金刚石膜的方法

摘要

PURPOSE: A method and an apparatus for manufacturing a diamond film are provided to manufacture a diamond film which is not damaged by accurately controlling temperature of a substrate, thus preventing temperature increase of the substrate during deposition and minimizing temperature gradient on the substrate horizontal surface. CONSTITUTION: In a method for manufacturing diamond film by vapor deposition, the method comprises the process of forming a power layer(9) having fluidity between a substrate(4) on which the diamond film is deposited and a substrate holder(5) so that the power layer(9) is used as a heat transfer medium between the substrate(4) and the substrate holder(5), wherein the powder layer(9) is consisted of a metal or ceramic powder, powder composing the powder layer is powder particles having a diameter of 1 mm or less, a separating preventing member such as a ring is formed on the outer side of the contact part between the substrate and the substrate holder to prevent external separation of the powder layer. The apparatus for manufacturing a diamond film by vapor deposition comprises a substrate on which the diamond film is deposited, a substrate holder holding the substrate, and a vacuum vessel receiving the substrate and substrate holder and connected to a plasma generating equipment, wherein the apparatus further comprises a powder layer formed between the substrate and the substrate holder.
机译:目的:提供一种用于制造金刚石膜的方法和设备,以制造通过精确地控制基板的温度而不会被损坏的金刚石膜,从而防止在沉积期间基板的温度升高并使基板水平面上的温度梯度最小化。组成:在一种通过气相沉积制造金刚石薄膜的方法中,该方法包括以下步骤:在沉积金刚石薄膜的基板(4)与基板支架(5)之间形成具有流动性的动力层(9)动力层(9)用作基板(4)与基板支架(5)之间的传热介质,其中粉末层(9)由金属或陶瓷粉末组成,构成粉末层的粉末为粉末在直径为1mm或更小的颗粒上,在基板和基板支架之间的接触部分的外侧形成防止分离的构件,例如环,以防止粉末层的外部分离。通过气相沉积制造金刚石膜的设备包括:在其上沉积金刚石膜的衬底;保持衬底的衬底支架;以及容纳该衬底和衬底支架并连接至等离子体产生设备的真空容器,其中该设备还包括包括在基底和基底支架之间形成的粉末层。

著录项

  • 公开/公告号KR100375335B1

    专利类型

  • 公开/公告日2003-03-06

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20010002721

  • 发明设计人 이재갑;은광용;이태기;

    申请日2001-01-17

  • 分类号C23C16/27;

  • 国家 KR

  • 入库时间 2022-08-21 23:45:40

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