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Ferroelectric characteristics of SrBi_4Ti_4O_(15) thin films grown on Pt/Ti/SiO_2/Si substrates by the soft chemical method

机译:通过软化学方法在Pt / Ti / SiO_2 / Si衬底上生长的SrBi_4Ti_4O_(15)薄膜的铁电特性

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摘要

Ferroelectric SrBi_4Ti_4O_(15) thin films were successfully prepared on a Pt (1 ll)/Ti/SiO_2/Si(100) substrate for the first time by spin coating, using the polymeric precursor method. X-ray diffraction patterns of the films indicate that they are polycrystalline in nature. Atomic force microscopy (AFM) analyses showed that the surface of these films is smooth, dense and crack-free with low surface roughness (6.4 nm). At room temperature and at a frequency of 1 MHz, the dielectric constant and the dissipation factor were, respectively, 150 and 0.022. The C-V characteristics of perovskite thin film prepared at low temperature show normal ferrolectric behaviour. The remanent polarization and coercive field for the films deposited were 5.4 mu C/cm~2 and 85 kV/cm, respectively. All the capacitors showed good polarization fatigue characteristics at least up to 1 X 10~(10) bipolar pulse cycles indicating that SrBi_4Ti_4O_(15) thin films can be a promising material for use in nonvolatile memories.
机译:使用聚合物前驱体方法,首次通过旋涂法成功地在Pt(1 ll)/ Ti / SiO_2 / Si(100)衬底上成功制备了铁电SrBi_4Ti_4O_(15)薄膜。膜的X射线衍射图表明它们本质上是多晶的。原子力显微镜(AFM)分析表明,这些薄膜的表面光滑,致密且无裂纹,且表面粗糙度低(6.4 nm)。在室温和1 MHz的频率下,介电常数和损耗因子分别为150和0.022。低温制备的钙钛矿薄膜的C-V特性显示出正常的铁电行为。沉积膜的剩余极化和矫顽场分别为5.4μC / cm〜2和85 kV / cm。所有电容器都显示出良好的极化疲劳特性,至少在1 X 10〜(10)个双极性脉冲周期内,表明SrBi_4Ti_4O_(15)薄膜可能是用于非易失性存储器的有前途的材料。

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