首页> 外文会议>International Conference on Manufacturing Science and Engineering >Synthesis and Ferroelectric Properties of Sol-gel Derived Intergrowth-Superlattice-structured SrBi_4Ti_4O_(15)-Bi_4Ti_3O_(12) Thin Films
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Synthesis and Ferroelectric Properties of Sol-gel Derived Intergrowth-Superlattice-structured SrBi_4Ti_4O_(15)-Bi_4Ti_3O_(12) Thin Films

机译:溶胶 - 凝胶的合成和铁电性质衍生生殖晶间 - 超晶格结构SRBI_4TI_4O_(15)-BI_4TI_3O_(12)薄膜

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Intergrowth-superlattice-structured SrBi_4Ti_4O_(15_-Bi_4Ti_3O_(12) (SBT-BIT) films prepared on p-Si substrates by sol-gel processing. Synthesized SBT-BIT films exhibit good ferroelectric properties. As the annealing temperature increases from 600°Cto 700°C, the remanent polarization P_r of SBT-BIT films increases, while the coercive electric field E_c decreases. SBT-BIT films annealed at 700°Chave a Pr value of 18.9μC/cm~2 which is higher than that of SBT (16.8μC/cm~2) and BIT (14.6μC/cm~2), and have the lowest E_c of 142 kV/cm which is almost the same as that of SBT and BIT. The C-V curves of Ag/SBT-BIT/p-Si heterostructures show the clockwise hysteresis loops which reveal the memory effect due to the polarization. The memory window in C-V curve of Ag/SBT-BIT/p-Si is larger than that of Ag/SBT/p-Si heterostructure or Ag/BIT/p-Si heterostructure.
机译:通过溶胶 - 凝胶加工在P-Si基材上制备的晶间晶间 - 超晶格结构的SRBI_4TI_4O_(15_-BI_4TI_3O_(12)(SBT-BIT)膜。合成的SBT比特膜表现出良好的铁电性能。随着退火温度从600°CTO增加700°C,SBT-比特膜的剩余偏振P_R增加,而矫顽电场E_C降低。SBT-BIT膜在700°CHAVE的PR值为18.9μC/ cm〜2的速度,其高于SBT( 16.8μc/ cm〜2)和比特(14.6μc/ cm〜2),具有142 kV / cm的最低E_c,与SBT和位的最低。AG / SBT位/的CV曲线P-Si异质结构显示顺时针滞后环,揭示由于极化引起的记忆效应。AG / SBT-BIT / P-Si的CV曲线中的存储器窗口大于AG / SBT / P-Si异质结构或AG的内存窗口/位/ p-si异质结构。

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