METHOD FOR MANUFACTURING SILICA THIN FILM ON SUBSTRATE SURFACE HAVING OPTIONAL SURFACE CHARACTERISTIC AND SURFACE FORM, AND COMPOSITE STRUCTURAL BODY

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a silica thin film having high density and excellent light transmitting property on a substrate having an optional form and surface characteristics, and to provide a method for controlling the surface roughness of the silica thin film.;SOLUTION: The method for manufacturing a silica thin film joined to a substrate surface includes processes of: (1) immersing the substrate in a solution comprising a silicon alkoxide, an alcohol, water and an alkali; (2) producing low-density silicate colloid having 1 to 30 nm diameter in the liquid by the hydrolysis of the silicon alkoxide in an alcohol solvent; (3) forming a uniform silica thin film having specified film thickness on the substrate in the liquid by deposition of the colloid on the substrate and by dehydration polycondensation; and (4) keeping the reaction liquid in a dynamic state in the above film deposition process. The invention also discloses a high light- transmitting composite structural body having the silica thin film manufactured by the above method as the surface layer thereof.;COPYRIGHT: (C)2004,JPO