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Effects of post-deposition annealing on the structure and optical properties of Y_2O_3 thin films

机译:沉积后退火对Y_2O_3薄膜结构和光学性能的影响

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摘要

Y_2O_3 thin film waveguides were prepared by RF magnetron sputtering. The effects of post-deposition annealing on the structure and optical properties have been investigated. The structural evolution of Y_2O_3 films with annealing temperature was investigated by X-ray diffraction (XRD). Spectroscopic ellipsometry was employed to determine the optical properties of Y_2O_3 films annealed at various temperatures. It was found that with increasing annealing temperature, the refractive index (n) of Y_2O_3 films increases. The optical band gap of Y_2O_3 films shifts to higher energy after higher temperature annealing, which is likely due to the reduction of defects and the change of crystalline structure in Y_2O_3 films.
机译:通过RF磁控溅射制备了Y_2O_3薄膜波导。研究了沉积后退火对结构和光学性能的影响。通过X射线衍射(XRD)研究了Y_2O_3薄膜在退火温度下的结构演变。椭圆偏振光谱法用于确定在不同温度下退火的Y_2O_3薄膜的光学性能。发现随着退火温度的升高,Y_2O_3膜的折射率(n)增加。 Y_2O_3薄膜的光学带隙在高温退火后转移到更高的能量,这很可能是由于Y_2O_3薄膜中缺陷的减少和晶体结构的变化。

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