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首页> 外文期刊>Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures >Local characterization of vapor-deposited electrode edges in thin film organic electronic devices
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Local characterization of vapor-deposited electrode edges in thin film organic electronic devices

机译:薄膜有机电子器件中气相沉积电极边缘的局部表征

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摘要

Scanning probe microscopy was used to characterize the shadow-mask-edge profiles formed during the vapor deposition of aluminum electrodes onto semiconducting polymer (poly-4,4′-4″-n-hexyl-triphenylamine) and gold substrates. Simultaneous topography and surface potential (Kelvin probe) imaging revealed a mask-edge profile with structure extending over a region much wider than the geometric penumbra behind the mask. The images of Al on polymer are interpreted in terms of an overlayer that is morphologically indistinguishable, but chemically distinct, from the polymer surface. On gold, a perforated granular metallic surface reveals coupled diffusion and kinetic processes that are consistent with growth of Al:Au intermetallic phases and void formation due to the faster diffusion of Al relative to Au, i.e., the Kirkendall effect.
机译:使用扫描探针显微镜来表征在铝电极气相沉积到半导体聚合物(聚-4,4'-4''-正己基三苯胺)和金基底上形成的阴影掩模边缘轮廓。同时进行的形貌和表面电势(Kelvin探针)成像显示了掩模边缘轮廓,其结构在比掩模后面的几何半影宽得多的区域中延伸。聚合物上的Al图像是根据与聚合物表面在形态上无法区分但化学上不同的覆盖层来解释的。在金上,穿孔的颗粒状金属表面显示出耦合的扩散和动力学过程,这与Al:Au金属间相的生长和空洞形成相一致,这归因于Al相对于Au的扩散较快,即柯肯德尔效应。

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