首页> 外文期刊>Journal of Vacuum Science & Technology. B >Electrical properties of molecular beam epitaxially grown Al_xGa_1-xGa_1-xSb_yAs_1-x and its application in inP-based high electron mobility transistors
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Electrical properties of molecular beam epitaxially grown Al_xGa_1-xGa_1-xSb_yAs_1-x and its application in inP-based high electron mobility transistors

机译:分子束外延生长的Al_xGa_1-xGa_1-xSb_yAs_1-x的电学性质及其在基于inP的高电子迁移率晶体管中的应用

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摘要

We have investigate the use of lattice-matched Al_xGa_1-xSbAs quaternary alloys in InP-based microelectronic devices. The band alignment for Al_xGa_1-xSbAs/InGaAs is calculated across the entire compositional range of x using van de walle and Martin's model solid theory, and the theoretical predictions agree with previously published values within 0.1-0.3 eV. Temperature-dependent current-voltage measurements are carried out on Au/Cr/Al_xGa_1-xSbAs Schottky diodes grown by molecular beam epitaxy.
机译:我们已经研究了基于InP的微电子器件中晶格匹配的Al_xGa_1-xSbAs四元合金的使用。使用van de walle和Martin模型固体理论在x的整个成分范围内计算Al_xGa_1-xSbAs / InGaAs的能带对准,其理论预测与先前发表的值在0.1-0.3 eV之内。温度相关的电流-电压测量是在通过分子束外延生长的Au / Cr / Al_xGa_1-xSbAs肖特基二极管上进行的。

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