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RF magnetron sputtering of ZnO and Al-doped ZnO films from ceramic and nanopowder targets: a comparative study

机译:射频磁控溅射陶瓷和纳米粉末靶材上的ZnO和Al掺杂的ZnO膜的比较研究

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摘要

Undoped zinc oxide (ZnO) and aluminium-doped zinc oxide (ZAO) thin films have been prepared on glass substrates by RF magnetron sputtering from ceramic and nanopowder targets at room temperature (RT). The effects of target nature on the properties of the films have been studied. The X-ray diffraction (XRD) patterns show that ZnO and Al-doped ZnO thin films are highly textured along the c-axis perpendicular to the surface of the substrate from either nanopowder or ceramic targets. From the SEM images, it appears that the surface morphologies of ZAO films exhibit difference from that of undoped ZnO films. All films exhibit a transmittance higher than 80% in the visible region. The optical band gap (Eg) of ZnO and ZAO films obtained from nanopowder target is higher than those prepared using ceramic target. In two cases, Al-doping leads to a larger optical band gap (Eg) of the films.
机译:在室温下,通过陶瓷和纳米粉末靶材的射频磁控溅射,在玻璃基板上制备了未掺杂的氧化锌(ZnO)和铝掺杂的氧化锌(ZAO)薄膜。研究了靶材性质对薄膜性能的影响。 X射线衍射(XRD)图谱显示,ZnO和Al掺杂的ZnO薄膜在垂直于基材表面的c轴上都具有很高的纹理,无论是纳米粉还是陶瓷靶。从SEM图像可以看出,ZAO膜的表面形态与未掺杂的ZnO膜的形态不同。所有薄膜在可见光区域的透射率均高于80%。纳米粉靶制备的ZnO和ZAO薄膜的光学带隙(E g )高于陶瓷靶制备的。在两种情况下,铝掺杂会导致薄膜的更大的光学带隙(E g )。

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