Comparative study on Al-doped ZnO films sputtered with ceramics and metal targets

摘要

ZnO:Al thin films were deposited on glass and Si wafer substrates respectively by sputtering ceramics ZnO:Al_2O_3 and reactively sputtering metal Zn:Al targets for the purpose to find a suitable method for improving both conductivity and transparency of the film. The properties of the deposited films were investigated to determine the differences between the sputtered and reactive sputtered samples by using scanning electron microscopy (SEM), X-ray diffraction (XRD), energy dispersive X-ray analysis (EDX), UV-VIS spectrometer and electrical measurements. The results show that the films sputtered reactively with metal have a very high crystalline quality and transmittance in the visible light wave range, while the films sputtered with ceramics can obtain good conductivity and its crystalline structural quality can be improved largely by introducing oxygen into the deposition system.