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Fully differential CMOS-MEMS z-axis accelerometer with torsional structures and planar comb fingers

机译:具有扭转结构和平面梳状指的全差分CMOS-MEMS z轴加速度计

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Fully differential z-axis acceleration sensing often requiresncomplicated multiwafer bonding processes. We present an integratednfully differential complementary metal-oxide semiconductor–micro-nelectromechanical systems u0001CMOS-MEMSu0002 z-axis accelerometer utiliz-ning planar comb fingers and a pair of single-crystal silicon u0001SCSu0002 tor-nsional springs. The sidewall capacitors formed by multiple CMOS inter-nconnect metal layers are exploited for fully differential displacementnsensing with a common-centroid wiring configuration. Single crystal sili-ncon is used throughout the device to form robust microstructures. A deepnreactive ion etching u0001DRIEu0002–based microfabrication process with largenprocessing tolerance has been developed to allow monolithic integrationnof CMOS circuitry with sensor structures and high fabrication yield. Withnan on-chip low-power, low-noise, dual-chopper amplifier that has a mea-nsured 44.5-dB gain and 1-mW power consumption, the fabricated inte-ngrated z-axis accelerometer demonstrates a sensitivity of 250 mV/g andnan overall noise floor of 110 u0001g/ u0001Hz
机译:完全差分z轴加速度感测通常需要复杂的多晶片键合工艺。我们提出了一种利用平面梳齿和一对单晶硅u0001SCSu0002扭力弹簧的集成差分微互补金属氧化物半导体微电子机械系统u0001CMOS-MEMSu0002 z轴加速度计。由多个CMOS互连金属层形成的侧壁电容器可利用共质心布线配置进行全差分位移传感。整个器件都使用单晶硅来形成坚固的微结构。已开发出具有较大处理公差的基于深度反应离子刻蚀的u0001DRIEu0002微加工工艺,以实现具有传感器结构和高成品率的CMOS电路的单片集成。借助可测量44.5dB增益和1mW功耗的片上低功耗,低噪声,双斩波放大器,制造出的集成式z轴加速度计的灵敏度为250 mV / g andnan总噪声系数为110 u0001g / u0001Hz

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