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Fully differential CMOS-MEMS z-axis accelerometer with torsional structures and planar comb fingers

机译:具有扭转结构和平面梳状指的全差分CMOS-MEMS z轴加速度计

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摘要

Fully differential z-axis acceleration sensing often requires complicated multiwafer bonding processes. We present an integrated fully differential complementary metal-oxide semiconductor-micro- electromechanical systems (CMOS-MEMS) z-axis accelerometer utilizing planar comb fingers and a pair of single-crystal silicon (SCS) torsional springs. The sidewall capacitors formed by multiple CMOS interconnect metal layers are exploited for fully differential displacement sensing with a common-centroid wiring configuration. Single crystal silicon is used throughout the device to form robust microstructures. A deep reactive ion etching (DRIE)-based microfabrication process with large processing tolerance has been developed to allow monolithic integration of CMOS circuitry with sensor structures and high fabrication yield. With an on-chip low-power, low-noise, dual-chopper amplifier that has a measured 44.5-dB gain and 1 -mW power consumption, the fabricated integrated z-axis accelerometer demonstrates a sensitivity of 250 mV/g and an Overall noise floor of 110 μg//Hz.
机译:完全差分z轴加速度感测通常需要复杂的多晶片键合工艺。我们介绍了一种利用平面梳状指和一对单晶硅(SCS)扭转弹簧的集成式全差分互补金属氧化物半导体微机电系统(CMOS-MEMS)z轴加速度计。由多个CMOS互连金属层形成的侧壁电容器可用于采用共形质心布线配置的全差分位移传感。在整个器件中使用单晶硅来形成坚固的微结构。已经开发出具有大处理公差的基于深反应离子蚀刻(DRIE)的微细加工工艺,以允许CMOS电路与传感器结构的单片集成以及高制造良率。借助内置的低功耗,低噪声,双斩波放大器,该放大器的实测增益为44.5 dB,功耗为1 mW,所制造的集成式z轴加速度计的灵敏度为250 mV / g,整体本底噪声为110μg// Hz。

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