机译:以(Ba_(0.3)Sr_(0.7))(Zn_(1/3)3Nb_(2/3))O_3为靶的射频磁控溅射方法溅射功率对介电陶瓷薄膜微观结构的影响
College of Physics and Electronics, Shandong Normal University, 250014 Jinan, People's Republic of China;
机译:退火时间对富锌(Ba_(0.3)Sr_(0.7))(Zn_(1/3)Nb_(2/3))O_3陶瓷靶进行射频磁控溅射陶瓷薄膜形貌的影响
机译:退火温度对以富锌(Ba_(0.3)Sr_(0.7))(Zn_(1/3)Nb_(2/3))O_3为靶的磁控溅射陶瓷薄膜晶体质量的影响
机译:以富锌(Ba_(0.3)Sr_(0.7))(Zn_(1/3)Nb_(2/3))O_3为靶的射频磁控溅射陶瓷薄膜的制备与表征
机译:高介电常数(Ba_(0.7)Sr_(0.3))(Ti_(0.9)Zr_(0.1))O_3使用等离子体处理的氧气空位效应的改进
机译:溅射参数对RF磁控溅射沉积ITO膜的影响
机译:大功率脉冲磁控溅射镍薄膜的斜角沉积
机译:LA0.7SR0.3MNO3CMR薄膜电阻沉积在SiO2 / Si和Si基板上,通过RF磁控溅射用于红外传感器