Oxygen Vacancy; High Dielectric Constant; Plasma Treatment; BSTZ; rf Sputtering;
机译:氧等离子体处理对(Ba_(0.7)Sr_(0.3))(Ti_(0.9)Zr_(0.1))O_3薄膜电学性能的影响
机译:常规退火过程中(Ba_(0.7)Sr_(0.3))(Ti_(0.9)Zr_(0.1))O_3薄膜的电和物理性质
机译:激光退火对(Ba_(0.7)Sr_(0.3))(Ti_(0.9)Zr_(0.1))O_3薄膜动态随机存取存储器电学特性的影响
机译:高介电常数(Ba_(0.7)Sr_(0.3))(Ti_(0.9)Zr_(0.1))O_3使用等离子体处理的氧气空位效应的改进
机译:空气等离子体处理在TiO2薄膜中形成氧空位和Ti3 +态并增强光学性能
机译:(Ba_(0.9)Sr_(0.1))(Ti_(0.999)Nb_(0.001))O _3陶瓷中晶粒长大的动力学指数