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Charge transport in solution-processed zinc tin oxide thin film transistors

机译:溶液处理的氧化锌锡薄膜晶体管中的电荷传输

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摘要

Zinc oxide-based transparent amorphous oxide semiconductors (TAOS) are strong contenders to replace amorphous and polycrystalline silicon for large area display backplanes due to their high electron mobility. To enable future roll-to-roll printed electronics, solution-processed fabrication methods are needed. Here, we use low-temperature measurements from 77 to 300 K to quantitatively compare charge transport mechanisms and band-tail density of states of solution-processed zinc tin oxide (ZTO) thin film transistors fabricated with different film composition and annealing temperature. The devices exhibit percolation conduction with Fermi level pinning at high charge carrier concentrations. The shape and energy levels of band-tail states can be engineered by process and stoichiometry. For optimal amorphous ZTO film with Zn:Sn ink ratio of 7:3 and annealing temperature of 480 ℃, the band structure exhibits Arrhenius and percolation energy values of 7 and 3 meV, respectively, better than those measured by others for vacuum-processed TAOS films, showing the potential of solution processing.
机译:基于氧化锌的透明无定形氧化物半导体(TAOS)由于其高电子迁移率而成为替代大面积显示器背板的非晶硅和多晶硅的有力竞争者。为了实现未来的卷对卷印刷电子产品,需要采用固溶处理的制造方法。在这里,我们使用从77到300 K的低温测量来定量比较以不同膜组成和退火温度制造的固溶处理的氧化锌锡(ZTO)薄膜晶体管的电荷传输机制和带尾密度。该器件在高载流子浓度下具有费米能级钉扎的渗流传导。带尾态的形状和能级可以通过过程和化学计量来设计。对于Zn:Sn墨水比为7:3,退火温度为480℃的最佳非晶ZTO薄膜,其能带结构分别显示出Arrhenius和渗透能值分别为7和3 meV,优于其他方法在真空处理的TAOS中测得的值。胶片,显示了溶液加工的潜力。

著录项

  • 来源
    《Journal of Materials Research》 |2012年第17期|p.2286-2292|共7页
  • 作者单位

    Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109-2122;

    Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109-2122;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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