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Pressure Driven 3He Flow Through Submicron Sized Apertures

机译:压力驱动的3 He流过亚微米孔径

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The flow of liquid 3He through different weak link structures was investigated at temperatures of 1 mK to 1 K and at pressures ≈0 bar by measuring the characteristic time τ which was needed for pressure equilibration between two volumes connected by the weak link. Two types of weak links were used, one with a regular structure of 65×65 holes of 150 nm diameter in a 50 nm thick SiN membrane, and another with 105 holes of 15 nm diameter statistically distributed over a 14 nm thick nitrocellulose film. For the flow through the 150 nm holes the expected transition from Knudsen flow at low T to viscous flow at high T was observed. To the contrary, the normal fluid 3He-flow through the 15 nm structure does not show any temperature dependence. The relaxation time τ dropped by orders of magnitude for both types of weak links below the superfluid transition.
机译:通过在1 mK到1 K的温度和≈0bar的压力下,通过测量特征时间τ来研究3He穿过不同的弱连接结构的流动,这是通过弱连接所连接的两个体积之间的压力平衡所需要的链接。使用了两种类型的弱连接,一种在50 nm厚的SiN膜中具有直径为150 nm的65×65个孔的规则结构,另一种具有统计地分布在14 nm厚的105 nm直径的105 孔硝酸纤维素膜。对于通过150 nm孔的流动,观察到了从低T的克努森流到高T的粘性流的预期过渡。相反,通过15nm结构的正常流体3He流没有显示任何温度依赖性。对于超流体转变以下的两种类型的弱连接,弛豫时间τ下降了数量级。

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