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Structural, optical and electrical properties of Ga-doped and (Ga, Co)-codoped ZnO films

机译:掺杂Ga和(Ga,Co)掺杂的ZnO薄膜的结构,光学和电学性质

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The Ga-doped and (Ga, Co)-codoped ZnO films were grown on quartz glass substrate by inductively coupled plasma enhanced physical vapor deposition. The effect of Co doping and oxygen pressure on the structural, optical, electrical and magnetic properties of the as-grown films was investigated. The structural characterization revealed that high-quality films were grown with wurtzite structure and c-axis preferred crystalline orientation. The surface morphology was affected by Co doping and oxygen pressure. Room-temperature ferromagnetism was observed in (Ga, Co)-codoped ZnO films. We found that the optical and electrical properties were degraded with Co doping. The Ga-doped ZnO films had an average transmittance of above 88% in the visible wavelength, while (Ga, Co)-codoped ZnO showed a lower average transmittance (~65%) due to the d-d transitions of Co~(2+). The resistivity and Hall mobility of (Ga, Co)-doped ZnO samples were lower than those of Ga-doped ZnO films when grown at the same oxygen pressure.
机译:通过电感耦合等离子体增强物理气相沉积法在石英玻璃基板上生长了掺杂Ga和(Ga,Co)的ZnO薄膜。研究了Co掺杂和氧气压力对生长膜的结构,光学,电和磁性能的影响。结构表征表明,生长出具有纤锌矿结构和c轴首选晶体取向的高质量薄膜。表面形态受Co掺杂和氧气压力的影响。在(Ga,Co)掺杂的ZnO薄膜中观察到室温铁磁性。我们发现,Co掺杂会降低光学和电学性能。掺Ga的ZnO薄膜在可见光波长下的平均透射率为88%以上,而掺(Ga,Co)的ZnO由于Co〜(2+)的dd跃迁而显示出较低的平均透射率(〜65%)。 。在相同的氧气压力下生长时,掺杂(Ga,Co)的ZnO样品的电阻率和霍尔迁移率低于掺杂Ga的ZnO膜的电阻率和霍尔迁移率。

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