Evaluation of microlithographic performance of ‘deep UV’ resists: Synthesis, and 2D NMR studies on alternating ‘high ortho’ novolak resins

摘要

Lithographic evaluation of a ‘deep UV’ negative photoresist is discussed along with the synthesis of an alternating ‘high-ortho’ novolak resin. 2-D NMR studies (COSY, NOESY, HSQC, HMBC) on this resin are also discussed.