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Evaluation of microlithographic performance of ‘deep UV’ resists: Synthesis, and 2D NMR studies on alternating ‘high ortho’ novolak resins

机译：评价“深紫色”抗蚀剂的微刻度性能：合成和2D NMR研究交替的“高邻”酚醛清漆树脂

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MANEESH SHARMA; ANANT A NAIK; P RAGHUNATHAN; S V ESWARAN;
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年度 2012
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1. Evaluation of microlithographic performance of ‘deep UV’ resists: Synthesis, and 2D NMR studies on alternating ‘high ortho’ novolak resins [J] . MANEESH SHARMA, ANANT A NAIK, P RAGHUNATHAN, Journal of Chemical Sciences . 2012,第2期

机译：评估“深紫外线”抗蚀剂的微光刻性能：交替使用“高邻位”线型酚醛清漆树脂的合成和2D NMR研究
2. Evaluation of microlithographic performance of `deep UVa€? resists: Synthesis, and 2D NMR studies on alternating `high orthoa€? novolak resins [J] . Anant A Naik, Maneesh Sharma, P Raghunathan, Journal of Chemical Sciences . 2012,第2期

机译：评估“深紫外线”的微光刻性能抗蚀剂：交替的“高邻位”合成和2D NMR研究酚醛清漆树脂
3. Azido-m-meconine-‘high ortho’ Novolak resin-based negative photoresists for deep UV lithography [J] . Maneesh Sharma, Anant A. Naik, Manoj Gaur, Journal of Chemical Sciences . 2009,第4期

机译：用于深度UV光刻的Azido-m-meconine-“高邻位” Novolak树脂基负性光刻胶
4. Studies of dissolution inhibition mechanism of DNQ-novolak resist (II): effect of extended ortho-ortho bond in novolak [C] . Kenji Honda, OCG Microelectronic Materials, Inc., Advances in Resist Technology and Processing VIII . 1991

机译：DNQ-novolak抗蚀剂的溶解抑制机理研究（II）：扩展的邻-邻键在酚醛清漆中的作用
5. Practicum Three, August 2000. Novel applications of carbon-13 indirect detection NMR to metabolic tracer studies in small tissue samples. Practicum Two, December 1998. Proton and platinum-195 NMR spectroscopic characterization of the products formed in reactions of N-isobutyramide-Gly-Phe-Leu-Gly-ethylenediamine and similar model ligands with potassium tetrachloroplatinate (II). Practicum One, August 1997. Synthesis of a polyamide containing repeating macrocyclic chelate units: Evaluation of its gadolinium(3+) complex as a MRI contrast agent. [D] . Burgess, Shawn C. 2000

机译：实习三，2000年8月。Carbon-13间接检测NMR在小组织样品中代谢示踪剂研究中的新应用。实习二，1998年12月。在N-异丁酰胺-Gly-Phe-Leu-Gly-乙二胺和类似的模型配体与四氯铂酸钾（II）反应中形成的产物的质子和铂195 NMR光谱表征。实习生一，1997年8月。包含重复的大环螯合单元的聚酰胺的合成：g（3+）复合物作为MRI造影剂的评估。
6. High-Performance and Self-Powered Deep UV Photodetectors Based on High Quality 2D Boron Nitride Nanosheets [O] . Ali Aldalbahi, Manuel Rivera, Mostafizur Rahaman, 2017

机译：基于高质量二维氮化硼纳米片的高性能自供电深紫外光电探测器
7. Non-conjugated cyclic dienes and maleic anhydride co-polymers, and derivatives for base resin of deep UV resist. [O] . TAKASHI YAMAMOTO, TORU SEITA 1994

机译：非缀合的环二烯和马来酸酐共聚物，以及深紫色抗蚀剂的基础树脂的衍生物。
8. Preliminary Evaluation of an Alternate Electrode Array for Use in Shallow Subsurface Electrical Resistivity Studies [R] . Carrington, T. J. , Watson, D. A. 1980

机译：用于浅层表面电阻率研究的交替电极阵列的初步评估

Evaluation of microlithographic performance of ‘deep UV’ resists: Synthesis, and 2D NMR studies on alternating ‘high ortho’ novolak resins

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