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Experimental investigation of the electron impact excitation behavior in pulse-modulated radio frequency Ar/O_2 inductively coupled plasma

机译:脉冲调制射频Ar / O_2感应耦合等离子体中电子碰撞激发行为的实验研究

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摘要

In inductively coupled plasmas (ICPs), mode transition between capacitive coupling (E mode) and inductive coupling (H mode) is a key issue. Using an intensified charge-coupled device camera, the mode transition-related behaviors of the electron impact excitation of Ar(2p(1)) are investigated under different discharge conditions in pulse-modulated radio-frequency (rf) Ar/O-2 ICPs. The initiation time of the E-H mode transition at the initial stage of a pulse period is examined under nanosecond time-resolution for the first time. It is found that the initiation time increases with increasing the applied power (300-600 W), while it decreases with raising the duty cycle (50%-80%) or gas pressure (20-80 mTorr). Besides, we also examined the spatial-temporal electron impact excitation rate over the whole pulse period (microsecond time-resolution), especially in the H mode when the discharge is operated at the steady state. We found that as the O-2 content/pressure increases, the electron impact excitation axially concentrates closer to the quartz window, and the bimodal structure becomes more prominent in the H mode. However, the excitation gets farther away from the window at higher power. In addition, the maximum value of the excitation rate appears earlier at the initial stage of a pulse period at higher pressure/O-2 content. Published under license by AIP Publishing.
机译:在电感耦合等离子体(ICP)中,电容耦合(E模式)和电感耦合(H模式)之间的模式转换是关键问题。使用增强的电荷耦合器件照相机,在脉冲调制射频(rf)Ar / O-2 ICPs中,研究了在不同放电条件下Ar(2p(1))的电子碰撞激发的模式转变相关行为。首次在纳秒时间分辨率下检查脉冲周期初始阶段E-H模式转换的启动时间。发现启动时间随施加的功率(300-600 W)的增加而增加,而随着占空比(50%-80%)或气压(20-80 mTorr)的增加而减少。此外,我们还研究了整个脉冲周期内的时空电子碰撞激发速率(微秒时间分辨率),特别是在放电在稳定状态下工作的H模式下。我们发现,随着O-2含量/压力的增加,电子冲击激发沿轴向集中在石英窗口附近,并且双峰结构在H模式下变得更加突出。但是,在更高的功率下,激励距离窗口越来越远。另外,在较高的压力/ O-2含量下,激发速率的最大值出现在脉冲周期的初期。由AIP Publishing授权发布。

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  • 来源
    《Journal of Applied Physics》 |2019年第2期|023303.1-023303.10|共10页
  • 作者单位

    Dalian Univ Technol, Sch Phys, Key Lab Mat Modificat Laser Ion & Electron Beams, Minist Educ, Dalian 116024, Peoples R China;

    Dalian Univ Technol, Sch Phys, Key Lab Mat Modificat Laser Ion & Electron Beams, Minist Educ, Dalian 116024, Peoples R China;

    Michigan State Univ, Dept Elect & Comp Engn, E Lansing, MI 48824 USA;

    Dalian Univ Technol, Sch Phys, Key Lab Mat Modificat Laser Ion & Electron Beams, Minist Educ, Dalian 116024, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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