HIGH-FREQUENCY INDUCTIVELY-COUPLED PLASMA SOURCE, AND HIGH-FREQUENCY INDUCTIVELY-COUPLED PLASMA DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a high-frequency inductively-coupled plasma source capable of forming plasma having a large outer diameter while restraining a coil diameter.;SOLUTION: A projecting part 3 projecting into a plasma generation chamber 2 is installed on an end face of the generation chamber 2. An excitation coil 4 for forming an A.C. magnetic field is stored in a recessed part formed in the projecting part 3. Since the projecting part 3 is formed of an insulator, plasma P1 cannot intrude into the inside region of the projecting part 3, a ring-like plasma region is formed between the projecting part 3 and the generation chamber 2. Thereby, the plasma 1 having the plasma region larger than the outer diameter of the excitation coil 4 can be formed.;COPYRIGHT: (C)2004,JPO