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Effects of direct current discharge on the spatial distribution of cylindrical inductively-coupled plasma at different gas pressures

机译:直流放电对不同气压下圆筒形电感耦合等离子体空间分布的影响

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摘要

Stable operations of single direct current (DC) discharge,single radio frequency (RF) discharge and DC + RF hybrid discharge are achieved in a specially-designed DC enhanced inductively-coupled plasma (DCE-ICP) source.Their plasma characteristics,such as electron density,electron temperature and the electron density spatial distribution profiles are investigated and compared experimentally at different gas pressures.It is found that under the condition of single RF discharge,the electron density distribution profiles show a ‘convex’ shape and ‘saddle’ shape at gas pressures of 3 mTorr and 150 mTorr respectively.This result can be attributed to the transition of electron kinetics from nonlocal to local kinetics with an increase in gas pressure.Moreover,in the operation of DC + RF hybrid discharge at different gas pressures,the DC discharge has different effects on plasma uniformity.The plasma uniformity can be improved by modulating DC power at a high pressure of 150 rTort where local electron kinetics is dominant,whereas plasma uniformity deteriorates at a low pressure of 3 mTorr where nonlocal electron kinetics prevails.This phenomenon,as analyzed,is due to the obvious nonlinear enhancement effect of electron density at the chamber center,and the inherent radial distribution difference in the electron density with single RF discharge at different gas pressures.
机译:在专门设计的直流增强型电感耦合等离子体(DCE-ICP)源中实现了单直流(DC)放电,单射频(RF)放电和DC + RF混合放电的稳定运行。它们的等离子体特性例如研究和比较了在不同气压下的电子密度,电子温度和电子密度的空间分布曲线。发现在单次射频放电条件下,电子密度分布曲线呈“凸”形和“鞍形”。在气压分别为3 mTorr和150 mTorr的情况下。该结果可以归因于随着气压的升高,电子动力学从非局部动力学转变为局部动力学。此外,在DC + RF混合放电在不同气压下的操作中,直流放电对等离子体均匀性的影响不同。可以通过在150 rTort的高压下调制直流功率来改善等离子体均匀性。电子动力学是主要的,而等离子体均匀性在3 mTorr的低压下会恶化,其中存在非局部电子动力学。分析表明,这种现象是由于腔室中心电子密度明显的非线性增强作用,以及固有的径向分布差异在不同气压下通过单个RF放电获得的电子密度

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  • 来源
    《等离子体科学和技术(英文版)》 |2018年第1期|32-40|共9页
  • 作者单位

    Key Laboratory of Materials Modification by Laser, Ion and Electron Beams(Dalian University of Technology), Ministry of Education, Dalian 116024, People's Republic of China;

    Key Laboratory of Materials Modification by Laser, Ion and Electron Beams(Dalian University of Technology), Ministry of Education, Dalian 116024, People's Republic of China;

    Key Laboratory of Materials Modification by Laser, Ion and Electron Beams(Dalian University of Technology), Ministry of Education, Dalian 116024, People's Republic of China;

    Key Laboratory of Materials Modification by Laser, Ion and Electron Beams(Dalian University of Technology), Ministry of Education, Dalian 116024, People's Republic of China;

    Key Laboratory of Materials Modification by Laser, Ion and Electron Beams(Dalian University of Technology), Ministry of Education, Dalian 116024, People's Republic of China;

  • 收录信息 中国科学引文数据库(CSCD);
  • 原文格式 PDF
  • 正文语种 eng
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