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首页> 外文期刊>Journal of Applied Physics >The formation of self-assembled InAs/GaAs quantum dots emitting at 1.3 μm followed by photoreflectance spectroscopy
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The formation of self-assembled InAs/GaAs quantum dots emitting at 1.3 μm followed by photoreflectance spectroscopy

机译:自组装InAs / GaAs量子点的形成,其在1.3μm处发射,然后进行光反射光谱

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Photoreflectance (PR) modulation spectroscopy, supported by photoluminescence (PL) and atomic force microscopy, was applied to the study of the optical properties of InAs/GaAs structures at the transition from the typical two-dimensional epitaxial growth to three-dimensional Stranski-Krastanov mode of InAs self-assembled quantum dot (QD) formation. Room temperature photoreflectance was measured on several molecular-beam epitaxy (MBE) grown structures, with growth conditions optimized for the 1.3 μm emission (an important window for telecommunication applications), differing in the nominal thickness of InAs layer from 1 to 2.5 ML (monolayer). The evolution of optical transitions connected with energy levels confined in a very thin InAs/GaAs quantum well was observed. For a small InAs nominal layer thickness (up to the critical thickness for the formation of three-dimensional islands), the heavy (light)-hole level to electron level transitions shift towards lower energy, indicating the increase in the quantum well width. When the nominal InAs layer thickness exceeds the critical value, the transition energies remain constant. It implies the formation of the so-called wetting layer, whose thickness is independent of the amount of deposited InAs material (fully driven by the strain). Its energy level structure was calculated (exploiting the effective mass approximation, with strain effects) in order to determine the actual wetting layer thickness, which was found to be approximately 1.6 ML. The features connected with the transitions between levels confined in QDs appear in PR and PL spectra for the amount of InAs material exceeding this number. The energies of the QD transitions shift to the red when the InAs layer nominal thickness is increased from 1.7 to 2 ML (indicating the increase in the average dot sizes) but remain constant for thicker layers, which is the evidence that the additional InAs material increases the density of QDs, but not their sizes. It points out at the existence of size limitation effect in the MBE growth of self-assembled QDs.
机译:由光致发光(PL)和原子力显微镜支持的光反射(PR)调制光谱技术被用于研究InAs / GaAs结构从典型的二维外延生长到三维Stranski-Krastanov的光学性质InAs自组装量子点(QD)形成的模式。室温光反射率是在几种分子束外延(MBE)生长的结构上测量的,其生长条件针对1.3μm发射(电信应用的重要窗口)进行了优化,InAs层的标称厚度从1到2.5 ML(单层)不同)。观察到与跃迁有关的光学跃迁的演化受限于非常薄的InAs / GaAs量子阱中。对于较小的InAs标称层厚度(达到形成三维岛的临界厚度),从重(轻)空穴能级到电子能级的跃迁移向较低能量,表明量子阱宽度增加。当标称InAs层厚度超过临界值时,跃迁能保持恒定。这意味着形成了所谓的润湿层,其厚度与沉积的InAs材料的量(由应变完全驱动)无关。计算其能级结构(利用有效的质量近似,以及应变效应),以确定实际的润湿层厚度,发现该厚度约为1.6 ML。当InAs材料的数量超过此数量时,与QD中限制的能级之间的过渡有关的特征会出现在PR和PL光谱中。当InAs层的标称厚度从1.7增加到2 ML(表示平均点尺寸的增加)时,QD的能量转换为红色,但对于较厚的层则保持不变,这表明额外的InAs材料会增加量子点的密度,而不是它们的大小。指出了自组装量子点的MBE增长中存在尺寸限制效应。

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