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Vertical cavity surface emitting lasers with InAs-InGaAs quantum dot active regions on GaAs substrates emitting at 1.3 /spl mu/m

机译:在GaAs衬底上具有InAs-InGaAs量子点有源区的垂直腔表面发射激光器,发射速率为1.3 / spl mu / m

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Pulsed lasing at 1.3 /spl mu/m via the exciton ground state is demonstrated for vertical cavity surface emitting lasers containing three uncoupled sheets of InAs quantum dot active layers. The dots lie within InGaAs quantum wells separated by GaAs barrier layers. The structures are grown on GaAs substrates and when fabricated include selectively oxidized AlO current apertures and AlO/GaAs distributed Bragg reflectors. Experimental devices operate pulsed at 20/spl deg/C with threshold currents below 2 mA and differential slope efficiencies of 40%.
机译:对于包含三个未耦合的InAs量子点有源层的垂直腔表面发射激光器,证明了通过激子基态以1.3 / splμm/ m的脉冲激射。这些点位于被GaAs势垒层隔开的InGaAs量子阱中。该结构生长在GaAs衬底上,并且在制造时包括选择性氧化的AlO电流孔和AlO / GaAs分布的布拉格反射器。实验设备以20 / spl deg / C的频率工作,阈值电流低于2 mA,差分斜率效率为40%。

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