Wetting layer states of InAs/GaAs self-assembled quantum dot structures: Effect of intermixing and capping layer

摘要

The authors present a modulated reflectivity study of the wetting layer (WL) states in molecular beam epitaxy grown InAs/GaAs quantum dot (QD) structures designed to emit light in the 1.3-1.5 μm range. A high sensitivity of the technique has allowed the observation of all optical transitions in the QD system, including low oscillator strength transitions related to QD ground and excited states, and the ones connected with the WL quantum well (QW). The support of WL content profiles, determined by transmission electron microscopy, has made it possible to analyze in detail the real WL QW confinement potential which was then used for calculating the optical transition energies. We could conclude that in spite of a very effective WL QW intermixing, mainly due to the Ga-In exchange process (causing the reduction of the maximum indium content in the WL layer to about 35% from nominally deposited InAs), the transition energies remain almost unaffected. The latter effect could be explained in effective mass envelope function calculations taking into account the intermixing of the QW interfaces described within the diffusion model. We have followed the WL-related transitions of two closely spaced QD layers grown at different temperatures, as a function of the In content in the capping layer. We have shown that changing the capping layer from pure GaAs to In_(0.236)Ga_(0.764)As has no significant influence on the composition profile of the WL itself and the WL QW transitions can be usually interpreted properly when based on the cap-induced modification of the confinement potential within a squarelike QW shape approximation. However, some of the observed features could be explained only after taking into consideration the effects of intermixing and InGaAs cap layer decomposition.