首页> 外文会议>Symposium on Semiconductor Quantum Dots >Effects of annealing on self-assembled InAs quantum dots and wetting layer in GaAs matrix
【24h】

Effects of annealing on self-assembled InAs quantum dots and wetting layer in GaAs matrix

机译:退火对GaAs基质自组装InAs量子点和润湿层的影响

获取原文

摘要

Post-growth thermal annealing effects on InAs/GaAs quantum dots (QDs) near Stransky-Krastanow transformation were investigated. Self-assembled QDs of average size of about 10 nm were grown by metalorganic vapour phase epitaxy. The photoluminescence (PL) due to emission from QDs as well as two peaks due to emission from the strained InAs wetting layer (WL) were observed in as-grown samples. Bimodal structure of the WL PL was attributed to WL regions of different thickness. There was almost no difference in the PL spectrum after 30 s annealing at 600°C. However, annealing at temperatures in the range between 700°C and 950°C resulted in quenching of the PL from QDS and the thinner WL. The PL peak from the new, thicker WL blue-shifted and narrowed with increasing annealing temperature. This behavior was in agreement with TEM observations. Complete dissolution of the QDs and substantial broadening of the WL was observed. All our results indicate that thermally induced modifications of the WL rather than QDs can be responsible for the blue-shift and narrowing of the PL peaks in structures containing InAs QDs.
机译:研究了对STRANSKY-Krastanow转化附近的INAS / GaAs量子点(QDS)的生长后热退火效果。通过金属蒸气相外延生长自组装的平均尺寸约为10nm的QD。在以生长的样品中观察到由于来自QDS的发射以及由于来自应变InAs润湿层(WL)的发射引起的两个峰的光致发光(PL)。 WL PL的双峰结构归因于不同厚度的WL区域。在600℃下的30℃后,PL光谱几乎没有差异。然而,在700℃和950℃之间的温度下的退火导致从QD和较薄的WL淬火PL。 PL峰从新的,较厚的WL蓝色移位和变窄随着退火温度的增加。这种行为与TEM观察一致。观察到QD的完全溶解和对WL的大量扩大。我们所有的结果表明,热诱导的WL而不是QDS的修改都可以负责含有INAS QDS的结构中PL峰的蓝色移位和变窄。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号