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Buffer-eliminated, charge-neutral epitaxial graphene on oxidized 4H-SiC (0001) surface

机译:在氧化的4H-SiC(0001)表面上消除缓冲的电荷中性外延石墨烯

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摘要

Buffer-eliminated, charge-neutral epitaxial graphene (EG) is important to enhance its potential in device applications. Using the first principles Density Functional Theory calculations, we investigated the effect of oxidation on the electronic and structural properties of EG on 4H-SiC (0001) surface. Our investigation reveals that the buffer layer decouples from the substrate in the presence of both silicate and silicon oxy-nitride at the interface, and the resultant monolayer EG is charge-neutral in both cases. The interface at 4H-SiC/silicate/EG is characterized by surface dangling electrons, which opens up another route for further engineering EG on 4H-SiC. Dangling electron-free 4H-SiC/silicon oxy-nitride/EG is ideal for achieving charge-neutral EG.
机译:消除缓冲的电荷中性外延石墨烯(EG)对于增强其在器件应用中的潜力至关重要。使用第一原理密度泛函理论计算,我们研究了氧化对4H-SiC(0001)表面EG的电子和结构性质的影响。我们的研究表明,在界面处同时存在硅酸盐和氮氧化硅的情况下,缓冲层会与基板分离,并且在两种情况下,所得的单层EG均为电荷中性。 4H-SiC /硅酸盐/ EG的界面以表面悬挂电子为特征,这为在4H-SiC上进一步工程化EG开辟了另一条途径。悬挂的无电子4H-SiC /氮氧化硅/ EG是实现电荷中性EG的理想选择。

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  • 来源
    《Journal of Applied Physics》 |2016年第21期|215305.1-215305.5|共5页
  • 作者单位

    Department of Physics, Southern Illinois University, Carbondale, Illinois 62901, USA;

    Also at Materials Technology Center, Southern Illinois University, Carbondale, IL 62901, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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