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Effects of excess carriers on charged defect concentrations in wide bandgap semiconductors

机译:过量载流子对宽带隙半导体中带电缺陷浓度的影响

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摘要

Unintentional doping and doping limits in semiconductors are typically caused by compensating defects with low formation energies. Since the formation enthalpy of a charged defect depends linearly on the Fermi level, doping limits can be especially pronounced in wide bandgap semiconductors where the Fermi level can vary substantially. Introduction of non-equilibrium carrier concentrations during growth or processing alters the chemical potentials of band carriers and allows populations of charged defects to be modified in ways impossible at thermal equilibrium. We demonstrate that in the presence of excess carriers, the rates of carrier capture and emission involving a defect charge transition level determine the admixture of electron and hole quasi-Fermi levels involved in the formation enthalpy of non-zero charge defect states. To understand the range of possible responses, we investigate the behavior of a single donor-like defect as functions of extrinsic doping and charge transition level energy. We find that that excess carriers will increase the formation enthalpy of compensating defects for most values of the charge transition level in the bandgap. Thus, it may be possible to use non-equilibrium carrier concentrations to overcome limitations on doping imposed by native defects. Cases also exist in which the concentration of defects with the same charge polarity as the majority dopant is either left unchanged or actually increases. This surprising effect arises when emission rates are suppressed relative to the capture rates and is most pronounced in wide bandgap semiconductors. We provide guidelines for carrying out experimental tests of this model. Published by AIP Publishing.
机译:半导体中的无意掺杂和掺杂限制通常是由补偿具有低形成能的缺陷引起的。由于带电缺陷的形成焓线性地取决于费米能级,因此在费米能级可能会发生很大变化的宽带隙半导体中,掺杂极限尤其明显。在生长或加工过程中引入非平衡载流子浓度会改变带载流子的化学势,并允许以热平衡时无法实现的方式修改带电缺陷的数量。我们证明,在存在过量载流子的情况下,涉及缺陷电荷跃迁能级的载流子俘获和发射速率决定了参与非零电荷缺陷态形成焓的电子和空穴准费米能级的混合。为了理解可能的响应范围,我们调查了单个供体样缺陷的行为,作为外在掺杂和电荷跃迁能级的函数。我们发现,过量的载流子会增加带隙中大多数电荷跃迁能级的补偿缺陷的形成焓。因此,有可能使用非平衡载流子浓度来克服自然缺陷对掺杂的限制。还存在其中电荷极性与多数掺杂剂相同的缺陷浓度保持不变或实际上增加的情况。当发射率相对于捕获率受到抑制时,会出现这种令人惊讶的效果,这在宽带隙半导体中最为明显。我们提供了进行此模型的实验测试的指南。由AIP Publishing发布。

著录项

  • 来源
    《Journal of Applied Physics》 |2018年第18期|185702.1-185702.11|共11页
  • 作者单位

    Natl Renewable Energy Lab, Golden, CO 80401 USA;

    Univ Utah, Mat Sci & Engn, Salt Lake City, UT 84112 USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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