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First-principles X-ray photoelectron spectroscopy binding energy shift calculation for boron and aluminum defects in 3C-silicon carbide

机译:3C-碳化硅中硼和铝缺陷的第一性原理X射线光电子能谱结合能移动计算

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摘要

We systematically investigated the core-level X-ray photoelectron spectroscopy (XPS) binding energy shifts of B 1s and Al 2p and formation energies for defects including boron and aluminum in 3C-silicon carbide (SiC) by first-principles calculation. We analyzed the relation between the XPS binding energy shift and defect states and found that the defects with localized electrons in the band gap or energy gap in the valence band have larger XPS relaxation energies (XPSREs) than those without localized electrons. In contrast, spread electrons and electrons localized away from the core hole hardly affect the XPSREs. Further, we analyzed the dependence on crystal matrices, that is, elemental and compound semiconductors, on XPS spectra by comparing the XPS spectra of Si and 3C-SiC. Although the variation of the local potential in 3C-SiC is larger than that in Si, the variations of their relaxation energies are comparable. (C) 2019 The Japan Society of Applied Physics
机译:通过第一性原理计算,我们系统地研究了3C碳化硅(SiC)中B 1s和Al 2p的核能级X射线光电子能谱(XPS)结合能位移以及包括硼和铝在内的缺陷的形成能。我们分析了XPS结合能移动与缺陷状态之间的关系,发现带隙中具有局部电子或价带中的能隙的缺陷比没有局部电子的缺陷具有更大的XPS弛豫能(XPSRE)。相反,散布的电子和远离核心孔的电子几乎不会影响XPSRE。此外,我们通过比较Si和3C-SiC的XPS光谱分析了XPS光谱对晶体矩阵(即元素半导体和化合物半导体)的依赖性。尽管3C-SiC中局部电势的变化大于Si中局部电势的变化,但其弛豫能的变化是可比较的。 (C)2019日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2019年第3期|031001.1-031001.10|共10页
  • 作者

    Matsushima Naoki; Yamauchi Jun;

  • 作者单位

    Keio Univ, Fac Sci & Technol, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan|SUMCO Corp, Technol Div, Imari, Saga 8494256, Japan;

    Keio Univ, Fac Sci & Technol, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan;

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