X- X- SYSTEM AND METHOD FOR CHARACTERIZING A FILM BY X-RAY PHOTOELECTRON AND LOW-ENERGY X-RAY FLUORESCENCE SPECTROSCOPY

摘要

Systems and methods for characterizing films by X-ray photoelectron spectroscopy (XPS) are disclosed. For example, a system for characterizing a film may include an X-ray source for generating an X-ray beam having an energy that is less than the k-edge of silicon. A sample holder may be included to position the sample in the path of the X-ray beam. A first detector may be included to collect the XPS signal generated by bombarding the sample with the X-ray beam. A second detector may be included for collecting the X-ray fluorescence (XRF) signal generated by bombarding the sample with the X-ray beam. Monitoring / estimation of primary X-ray flux at the assay site may be provided by X-ray flux detectors near and at the assay site. XRF and XPS signals may be normalized to the (estimated) primary X-ray flux to enable film thickness or dose measurements without the need to employ signal intensity ratios.