Design and Fabrication of MOS Device Circuits with Reticle-Free Exposure Method

摘要

An arbitrary pattern exposure method employing a liquid crystal display (LCD) for the formation of projection images has been applied to the design and fabrication of metal oxide semiconductor (MOS) devices and circuits. In this process, a transparent-type LCD with 1024 x 768 pixels and a g-line stepper were used. To realize the global pattern alignment on the stepper, we newly arranged an LCD reticle fitting the LCD on a quartz reticle which has a conventional alignment mark suitable for the stepper, in place of a conventional glass reticle. The MOS devices has been newly designed and fabricated with four layers in order to evaluate this new lithography concept. It has been confirmed that the n-MOS device can be correctly fabricated by this concept with reducing the manufacturing time. From the results, it is convinced that this method has the potential for replacing conventional glass reticles, particularly in the trial stage of device development.