Thin-Film Deposition of Metal Oxides by Aerosol-Assisted Chemical Vapour Deposition: Evaluation of Film Crystallinity

摘要

Sn-doped In_2O_3 (ITO) thin films are deposited on glass substrates using 0.2 M aqueous and methanol solutions of InCl_3(4H_2O) with 5mol% SnCl_2(2H_2O) by aerosol-assisted chemical vapour deposition under positive and negative temperature gradient conditions. The film crystallinity is evaluated by determining the film thickness dependence of X-ray diffraction peak height. When using aqueous solution, the ITO films grow with the same crystallinity during the deposition, but when using methanol solution, the preferred orientation of ITO changes during the deposition.