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Electroluminescence Phenomena In Ingan/gan Multiple Quantum Well Light-emitting Diodes With Electron Tunneling Layer

机译:具有电子隧穿层的Ingan / gan多量子阱发光二极管中的电致发光现象

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The phenomena of electroluminescence in InGaN/GaN multiple quantum well (MQW) light-emitting diodes (LEDs) with an n-AlGaN layer and a superlattice of 10 periods of InGaN (10 A)/GaN (15 A) serving as the electron tunneling layer (ETL) have been investigated in detail over a broad temperature range from 20 to 300 K at various injection currents. Compared with conventional LEDs with a well-designed ETL, quantum efficiency and temperature insensitivity are found to be improved when an n-AlGaN layer is inserted. This is attributed to the localization effect of the n-AlGaN layer being stronger than that of the ETL layer, as analyzed using the Varshini formula and band-tail model. Nevertheless, the inserted ETL layer with the purpose of improving the carrier injection into the active layer not only increases the carrier recombination quantity, which leads to a marked increase in output light emission intensity, but also reduces the light emission intensity compared with sample with the n-AlGaN layer. Consequently, inserting a blocking layer between an active layer and a p-GaN layer may increase the output light emission intensity of the sample with an ETL.
机译:具有n-AlGaN层和用作电子隧穿的InGaN(10 A)/ GaN(15 A)的10个周期的超晶格的InGaN / GaN多量子阱(MQW)发光二极管(LED)中的电致发光现象在各种注入电流下,在20至300 K的较宽温度范围内,对层(ETL)进行了详细研究。与具有精心设计的ETL的传统LED相比,发现当插入n-AlGaN层时,量子效率和温度不敏感性得以改善。如使用Varshini公式和带尾模型所分析的,这归因于n-AlGaN层的定位作用强于ETL层。然而,为了改善载流子注入到有源层中的目的而​​插入的ETL层不仅增加了载流子复合量,这导致输出光发射强度显着增加,而且与具有载流子的样品相比降低了光发射强度。 n-AlGaN层。因此,在有源层和p-GaN层之间插入阻挡层可以增加具有ETL的样品的输出发光强度。

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