Large-Area Growth of In-Plane Oriented (1120) ZnO Films by Linear Cathode Magnetron Sputtering

摘要

(1120) Textured ZnO films are good candidates for shear-mode piezoelectric devices. In the previous deposition techniques of these films, there have been two problems related to their practical application. These problems are as follows: (i) highly oriented films can be obtained only in a small area and (ii) the crystallite c-axis of in the films is radially oriented in the substrate plane. To resolve these problems, the sputtering deposition technique using a linear cathode has been proposed. The in-plane and out-of-plane orientations of the films were quantitatively determined by pole figure analysis. As a result, we have demonstrated the formation of in-plane unidirectionally oriented (1120) ZnO films over the entire area of 4-in. silicon wafers.