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Deposition of Amorphous Zinc Indium Tin Oxide and Indium Tin Oxide Films on Flexible Poly(ether sulfone) Substrate Using RF Magnetron Co-sputtering System

机译:射频磁控共溅射系统在柔性聚醚砜衬底上沉积非晶态氧化锌铟锡薄膜和铟锡氧化物薄膜

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摘要

Zn-In-Sn-O (ZITO) and In-Sn-O (ITO) thin films were deposited at room temperature on poly(ether sulfone) (PES) substrates using a combinatorial rf magnetron co-sputtering system. The cationic contents of the films were varied using a compositionally combinatorial technique. The average optical transmittance of the ZITO films was >80% in the visible region. The ZITO films showed an amorphous phase regardless of the zinc content. A minimum resistivity of 4.1 × 10~(-4) Ω·cm was obtained at a zinc content of 8.9 at. % [Zn/(In + Zn + Sn)]. The amorphous ZITO films deposited on flexible substrates had good mechanical durability against external dynamic stress, as measured using a bending test. Overall, the characteristics of the ZITO films were comparable or superior to those of the amorphous ITO films, and thus ZITO films may serve as a viable, low-cost alternative for electrode applications in flexible organic light-emitting diodes or organic solar cells.
机译:使用组合式射频磁控共溅射系统在室温下将Zn-In-Sn-O(ZITO)和In-Sn-O(ITO)薄膜沉积在聚醚砜(PES)基板上。膜的阳离子含量使用组成组合技术变化。 ZITO膜在可见光区域的平均透光率> 80%。无论锌含量如何,ZITO膜均显示出非晶相。锌含量为8.9 at。时,最小电阻率为4.1×10〜(-4)Ω·cm。 %[Zn /(In + Zn + Sn)]。使用弯曲试验测量,沉积在柔性基板上的非晶ZITO膜对外部动态应力具有良好的机械耐久性。总体而言,ZITO膜的特性与非晶ITO膜相当或更好,因此ZITO膜可作为柔性有机发光二极管或有机太阳能电池中电极应用的可行,低成本替代品。

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  • 来源
    《Japanese journal of applied physics》 |2010年第3issue1期|p.035801.1-035801.5|共5页
  • 作者单位

    National Center for Nanoprocess and Equipments, Honam Technology Service Division, Korea Institute of Industrial Technology, Gwangju 500-480, Korea;

    Materials and Structures Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

    National Center for Nanoprocess and Equipments, Honam Technology Service Division, Korea Institute of Industrial Technology, Gwangju 500-480, Korea;

    National Center for Nanoprocess and Equipments, Honam Technology Service Division, Korea Institute of Industrial Technology, Gwangju 500-480, Korea;

    National Center for Nanoprocess and Equipments, Honam Technology Service Division, Korea Institute of Industrial Technology, Gwangju 500-480, Korea;

    National Center for Nanoprocess and Equipments, Honam Technology Service Division, Korea Institute of Industrial Technology, Gwangju 500-480, Korea;

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