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首页> 外文期刊>Japanese journal of applied physics >Electroluminescence Analysis and Simulation of the Effects of Injection and Temperature on Carrier Distribution in InGaN-Based Light-Emitting Diodes with Color-Coded Quantum Wells
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Electroluminescence Analysis and Simulation of the Effects of Injection and Temperature on Carrier Distribution in InGaN-Based Light-Emitting Diodes with Color-Coded Quantum Wells

机译:注入和温度对带颜色编码量子阱的基于InGaN的发光二极管中载流子分布的电致发光分析和仿真

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摘要

This paper reports on an extensive analysis of the electroluminescence characteristics of InGaN-based LEDs with color-coded structure, i.e., with a triple quantum well structure in which each quantum well has a different indium content. The analysis is based on combined electroluminescence measurements and two-dimensional simulations, carried out at different current and temperature levels. Results indicate that (ⅰ) the efficiency of each of the quantum wells strongly depends on device operating conditions (current and temperature); (ⅱ) at low current and temperature levels, only the quantum well closer to the p-side has a significant emission; (ⅲ) emission from the other quantum wells is favored at high current levels. The role of carrier injection, hole mobility, carrier density and non-radiative recombination in determining the relative intensity of the quantum wells is discussed in the text.
机译:本文报道了对具有颜色编码结构即三量子阱结构的InGaN基LED的电致发光特性的广泛分析,其中每个量子阱具有不同的铟含量。该分析基于在不同电流和温度水平下进行的组合电致发光测量和二维模拟。结果表明:(ⅰ)每个量子阱的效率在很大程度上取决于器件的工作条件(电流和温度); (ⅱ)在低电流和低温度水平下,只有靠近p侧的量子阱才会发射大量光; (ⅲ)在高电流水平下,其他量子阱的发射是有利的。本文讨论了载流子注入,空穴迁移率,载流子密度和非辐射复合在确定量子阱相对强度中的作用。

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  • 来源
    《Japanese journal of applied physics》 |2013年第8issue2期|08JG09.1-08JG09.5|共5页
  • 作者单位

    Universita di Padova, Department of Information Enginnering, 35131 Padova, Italy;

    Universita di Padova, Department of Information Enginnering, 35131 Padova, Italy;

    Universita di Padova, Department of Information Enginnering, 35131 Padova, Italy;

    Universita di Padova, Department of Information Enginnering, 35131 Padova, Italy;

    University of Cambridge, Department of Materials Science and Metallurgy, Cambridge CB2 3QZ, U.K.;

    University of Cambridge, Department of Materials Science and Metallurgy, Cambridge CB2 3QZ, U.K.;

    Politecnico di Torino, DET, 10129 Torino, Italy;

    Politecnico di Torino, DET, 10129 Torino, Italy;

    Politecnico di Torino, DET, 10129 Torino, Italy;

    Politecnico di Torino, DET, 10129 Torino, Italy;

    Boston University, ECE Department, Boston, MA 02215, U.S.A.;

    Universita di Padova, Department of Information Enginnering, 35131 Padova, Italy;

    Universita di Padova, Department of Information Enginnering, 35131 Padova, Italy;

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