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Suppression of tunneling rate fluctuations in tunnel field-effect transistors by enhancing tunneling probability

机译:通过提高隧穿概率来抑制隧道场效应晶体管的隧穿速率波动

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摘要

This paper discusses the impact of the tunneling probability on the variability of tunnel field-effect transistors (TFETs). Isoelectronic trap (IET) technology, which enhances the tunneling current in TFETs, is used to suppress the variability of the ON current and threshold voltage. The simulation results show that suppressing the tunneling rate fluctuations results in suppression of the variability. In addition, a formula describing the relationship between the tunneling rate fluctuations and the electric field strength is derived based on Kane's band-to-band tunneling model. This formula indicates that the magnitude of the tunneling rate fluctuations is proportional to the magnitude of the fluctuations in the electric field strength and a higher tunneling probability results in a lower variability. The derived relationship is universally valid for any technologies that exploit enhancement of the tunneling probability, including IET technology, channel material engineering, heterojunctions, strain engineering, etc. (C) 2017 The Japan Society of Applied Physics
机译:本文讨论了隧穿概率对隧道场效应晶体管(TFET)变异性的影响。等电阱(IET)技术可增强TFET中的隧道电流,用于抑制导通电流和阈值电压的变化。仿真结果表明,抑制隧穿速率波动可抑制变异性。另外,基于凯恩的带间隧穿模型,导出了描述隧穿速率波动与电场强度之间关系的公式。该公式表明,隧穿速率波动的大小与电场强度波动的大小成比例,并且较高的隧穿概率导致较低的可变性。所推导的关系对于利用隧穿概率提高的任何技术都普遍适用,包括IET技术,通道材料工程,异质结,应变工程等。(C)2017日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2017年第4s期|04CD02.1-04CD02.5|共5页
  • 作者单位

    Natl Inst Adv Ind Sci & Technol, Nanoelect Res Inst NeRI, Tsukuba, Ibaraki 3058568, Japan;

    Natl Inst Adv Ind Sci & Technol, Nanoelect Res Inst NeRI, Tsukuba, Ibaraki 3058568, Japan;

    Natl Inst Adv Ind Sci & Technol, Nanoelect Res Inst NeRI, Tsukuba, Ibaraki 3058568, Japan;

    Natl Inst Adv Ind Sci & Technol, Nanoelect Res Inst NeRI, Tsukuba, Ibaraki 3058568, Japan;

    Natl Inst Adv Ind Sci & Technol, Nanoelect Res Inst NeRI, Tsukuba, Ibaraki 3058568, Japan;

    Natl Inst Adv Ind Sci & Technol, Nanoelect Res Inst NeRI, Tsukuba, Ibaraki 3058568, Japan;

    Natl Inst Adv Ind Sci & Technol, Nanoelect Res Inst NeRI, Tsukuba, Ibaraki 3058568, Japan;

    Natl Inst Adv Ind Sci & Technol, Nanoelect Res Inst NeRI, Tsukuba, Ibaraki 3058568, Japan;

    Natl Inst Adv Ind Sci & Technol, Nanoelect Res Inst NeRI, Tsukuba, Ibaraki 3058568, Japan;

    Natl Inst Adv Ind Sci & Technol, Nanoelect Res Inst NeRI, Tsukuba, Ibaraki 3058568, Japan;

    Natl Inst Adv Ind Sci & Technol, Nanoelect Res Inst NeRI, Tsukuba, Ibaraki 3058568, Japan;

    Natl Inst Adv Ind Sci & Technol, Nanoelect Res Inst NeRI, Tsukuba, Ibaraki 3058568, Japan;

    Natl Inst Adv Ind Sci & Technol, Nanoelect Res Inst NeRI, Tsukuba, Ibaraki 3058568, Japan;

    Natl Inst Adv Ind Sci & Technol, Nanoelect Res Inst NeRI, Tsukuba, Ibaraki 3058568, Japan;

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