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RF power FinFET transistors with a wide drain-extended fin

机译:射频功率FinFET晶体管具有宽的漏极扩展鳍

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摘要

Drain-extended FinFET transistors for RF power applications have been fabricated and is presented in this paper. Power FinFETs with a wide drain extension are proposed to reduce the drain resistance. Compared with conventional drain-extended FinFETs, our proposed new devices exhibit lower on-resistances and better high-frequency performances while keeping a similar breakdown voltage. The enhancements of the on-resistance and peak cutoff frequency are 16 and 56%, respectively, under an optimal drain-extension layout. These experimental results suggest that FinFET transistors with a wide drain extension could be used for RF power applications, increasing the possibility of integrating RF power parts into future FinFET system-on-a-chip technologies. (C) 2017 The Japan Society of Applied Physics
机译:已经制造出用于射频功率应用的漏极扩展FinFET晶体管,并在本文中进行介绍。提出了具有宽漏极扩展范围的功率FinFET,以降低漏极电阻。与传统的漏极扩展FinFET相比,我们提出的新器件在保持相似的击穿电压的同时,具有更低的导通电阻和更高的高频性能。在最佳漏极扩展布局下,导通电阻和峰值截止频率的增强分别为16%和56%。这些实验结果表明,具有宽漏极扩展的FinFET晶体管可用于RF功率应用,从而增加了将RF功率器件集成到未来的FinFET片上系统技术中的可能性。 (C)2017日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2017年第4s期|04CR09.1-04CR09.4|共4页
  • 作者单位

    Natl Nano Device Labs, Hsinchu 300, Taiwan|Natl Chiao Tung Univ, Dept Mat Sci & Engn, Hsinchu 300, Taiwan;

    Natl Nano Device Labs, Hsinchu 300, Taiwan;

    Natl Nano Device Labs, Hsinchu 300, Taiwan;

    Natl Nano Device Labs, Hsinchu 300, Taiwan|Natl Chiao Tung Univ, Dept Elect Engn, Hsinchu 300, Taiwan;

    Natl Nano Device Labs, Hsinchu 300, Taiwan;

    Natl Nano Device Labs, Hsinchu 300, Taiwan;

    Natl Nano Device Labs, Hsinchu 300, Taiwan;

    Natl Nano Device Labs, Hsinchu 300, Taiwan;

    Natl Chiao Tung Univ, Dept Mat Sci & Engn, Hsinchu 300, Taiwan;

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  • 正文语种 eng
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