首页> 外文期刊>International journal of hydrogen energy >Photoelectrochemical study of ZnIn_2Se_4 electrodes fabricated using selenization of RF magnetron sputtered Zn-In metal precursors
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Photoelectrochemical study of ZnIn_2Se_4 electrodes fabricated using selenization of RF magnetron sputtered Zn-In metal precursors

机译:射频磁控溅射Zn-In金属前驱体硒化制备的ZnIn_2Se_4电极的光电化学研究

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摘要

Polycrystalline ZnIn_2Se_4 samples are grown on glass substrates and fluorine-doped tin oxide coated glass substrates using the selenization of radio-frequency magnetron sputtered Zn-In metal alloys. The effect of the [Zn]/[Zn + In] molar ratio in the metal alloys on the physical and photoelectrochemical properties of the samples is investigated. X-ray diffraction patterns of samples reveal that the samples are polycrystalline tetragonal ZnIn_2Se_4. The thicknesses and direct band gaps of the samples are in the ranges of 1.15 -1.44 μm and 1.68-1.81 eV, as obtained from surface profile measurements and trans-mittance/reflectance spectra, respectively. The flat-band potentials of the samples in 0.6 M K_2SO_3 electrolyte are in the range of -0.41 to -0.95 V vs. an Ag/AgCl reference electrode. The highest photoelectrochemical response of samples was 1.84 mA/cm~2 at an external potential of +1.0 V vs. an Ag/AgCl electrode in 0.6 M K_2SO_3 solution under illumination from a 300 W Xe lamp system with the light intensity set at 100 mW/cm~2.
机译:使用射频磁控溅射Zn-In金属合金的硒化作用,在玻璃基板和掺氟氧化锡涂层的玻璃基板上生长多晶ZnIn_2Se_4样品。研究了金属合金中[Zn] / [Zn + In]摩尔比对样品物理和光电化学性能的影响。样品的X射线衍射图表明,样品为多晶的四方ZnIn_2Se_4。样品的厚度和直接带隙分别在1.15 -1.44μm和1.68-1.81 eV的范围内,分别从表面轮廓测量和透射/反射光谱获得。与Ag / AgCl参比电极相比,在0.6 M K_2SO_3电解质中样品的平带电势在-0.41至-0.95 V的范围内。在300 W Xe灯系统的照明下,在光强为100 mW的情况下,在0.6 M K_2SO_3溶液中,外部电势为+1.0 V时,样品的最高光电化学响应为1.84 mA / cm〜2,相对于Ag / AgCl电极。 /厘米〜2。

著录项

  • 来源
    《International journal of hydrogen energy》 |2012年第18期|p.13763-13769|共7页
  • 作者单位

    Department of Chemical and Materials Engineering, Chang Gung University, 259 Wen-Hma 1st Rd., Kwei-Shan,Taoyuan 333, Taiwan;

    Department of Chemical and Materials Engineering, Chang Gung University, 259 Wen-Hma 1st Rd., Kwei-Shan,Taoyuan 333, Taiwan;

    Department of Chemical and Materials Engineering, Chang Gung University, 259 Wen-Hma 1st Rd., Kwei-Shan,Taoyuan 333, Taiwan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    hydrogen production; photoelectrode; ZnIn_2Se_4; magnetron sputtering;

    机译:制氢光电极ZnIn_2Se_4;磁控溅射;
  • 入库时间 2022-08-18 00:28:30

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