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Growth of Uniform and Self-Aligned InAs Quantum Dots on Vicinal (100) GaAs Substrate by Metal Organic Chemical Vapor Deposition Technique for Laser Applications

机译:激光应用金属有机化学气相沉积技术在直立(100)GaAs衬底上生长均匀且自对准的InAs量子点

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Self-assembled InAs quantum dots (QDs) were grown on vicinal (100) GaAs substrate. Effect of InAs coverage and growth temperature was studied to optimize QDs for laser applications. The density and size distribution of QDs varied with the change in InAs coverage and growth temperature. Growth temperature was varied from 400 to 450°C and InAs coverage was varied between 1.40 and 2.35 monolayers (MLs). Optimum growth temperature was found to be 420°C. Density of QDs was first increased and then decreased with increase in InAs coverage. Linear increase in size and height of QDs was observed with increase in both growth temperature and InAs Coverage. It was observed that these two parameters play crucial role in optimization of uniform QDs.View full textDownload full textKeywordsInAs, Quantum Dots, GaAs substrate, Atomic Force Microscope, Self-assembledRelated var addthis_config = { ui_cobrand: "Taylor & Francis Online", services_compact: "citeulike,netvibes,twitter,technorati,delicious,linkedin,facebook,stumbleupon,digg,google,more", pubid: "ra-4dff56cd6bb1830b" }; Add to shortlist Link Permalink http://dx.doi.org/10.1080/10584587.2010.504412
机译:自组装的InAs量子点(QD)在附近(100)GaAs衬底上生长。研究了InAs覆盖率和生长温度的影响,以优化激光应用的量子点。 QD的密度和尺寸分布随InAs覆盖率和生长温度的变化而变化。生长温度从400到450°C不等,InAs覆盖范围在1.40和2.35单层(MLs)之间变化。发现最佳生长温度为420°C。 QD的密度首先随着InAs覆盖率的增加而增加,然后降低。随着生长温度和InAs覆盖率的增加,观察到QD的尺寸和高度线性增加。据观察,这两个参数在优化统一QD中起着至关重要的作用。查看全文下载全文关键字InAs,量子点,GaAs衬底,原子力显微镜,自组装相关var addthis_config = {ui_cobrand:“泰勒和弗朗西斯在线”,services_compact: “ citeulike,netvibes,twitter,technorati,美味,linkedin,facebook,stumbleupon,digg,google,更多”,pubid:“ ra-4dff56cd6bb1830b”};添加到候选列表链接永久链接http://dx.doi.org/10.1080/10584587.2010.504412

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