Compensator control for chemical vapor deposition film growth usingreduced-order design models

摘要

We present a summary of investigations on the use of propernorthogonal decomposition techniques as a reduced basis method forncomputation of feedback controls and compensators in a high-pressurenchemical vapor deposition (HPCVD) reactor. These investigationsnincorporate multiple species and controls, gas phase reactions, and timendependent tracking signals that are consistent with pulsed vapornreactant inputs. Numerical implementation of the model-based feedbackncontrol uses a reduced-order state estimator, based on partial statenobservations of the fluxes of reactants at the substrate center, whichncan be achieved with current sensing technology. We demonstrate that thenreduced-order state estimator or compensator system is capable ofnsubstantial control authority when applied to the full system