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首页> 外文期刊>IEEE Transactions on Nuclear Science >Study of neutron damage in GaAs MESFETs
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Study of neutron damage in GaAs MESFETs

机译:GaAs MESFET中子损伤的研究

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摘要

Implanted channel GaAs MESFETs subjected to neutron irradiation show large modifications of the pinch-off voltage, open-channel saturation current, and transconductance in agreement with previous results. In this work we demonstrate how an experimental technique, based on the frequency dispersion of the transconductance, g/sub m/(f), and output conductance, g/sub D/(f), can identify the deep levels induced by neutron irradiation through measurements performed directly on packaged devices. After irradiation, a frequency dispersion of the transconductance has been observed, while it was flat in the unirradiated device. The g/sub m/(f) curve shape depends on the device bias conditions, and it has permitted for the first time to evaluate the activation energy of different deep levels induced by neutron irradiation in MESFETs.
机译:经中子辐照的注入沟道GaAs MESFET显示出夹断电压,明渠饱和电流和跨导的较大变化,与先前的结果一致。在这项工作中,我们展示了一种基于跨导频率色散g / sub m /(f)和输出电导g / sub D /(f)的实验技术如何识别中子辐照引起的深能级通过直接在封装设备上执行的测量。辐照后,观察到跨导的频散,而在未辐照的器件中跨导是平坦的。 g / sub m /(f)曲线的形状取决于器件的偏置条件,并且首次允许评估MESFET中中子辐照引起的不同深能级的活化能。

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