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Neutron/gamma induced damage mechanisms and synergistic effects in GaAs MESFETs

机译:GaAs MESFET中的中子/γ诱导的损伤机理和协同效应

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摘要

Gallium arsenide n-channel MESFETs were irradiated with gamma rays up to 2.4*10/sup 7/ rads and with neutrons from 2.1*10/sup 13/ to 2.1*10/sup 15/ n/cm/sup 2/, partially annealed, and reirradiated with gamma rays. DC measurements on these devices at every irradiation and postirradiation step were used to analyze the details of the induced damage mechanisms. The overall damage process is shown to consist of two stages: in the low to medium neutron exposure range (up to approximately 8*10/sup 14/ n/cm/sup 2/), the predominant mechanism is the removal of charge carriers with the overall damage effect being moderate; for larger neutron exposures the predominant mechanism is the reduction of carrier mobility with the damage effect being quite pronounced. It is suggested that a part of the neutron-induced damage may remain latent in the form of displacement defects without trapped charge carriers. Subsequent results on two identical device sets irradiated with the same neutron fluence and gamma dose, except with the neutron/gamma exposure order reversed, exhibit this synergistic effect.
机译:用高达2.4 * 10 / sup 7 / rads的伽马射线和2.1 * 10 / sup 13 /至2.1 * 10 / sup 15 / n / cm / sup 2 /的中子辐照砷化镓n沟道MESFET,进行部分退火,并用伽玛射线重新照射。这些设备在每个辐照和辐照后步骤的直流测量都用于分析诱发损伤机理的细节。结果表明,整个损伤过程包括两个阶段:在中低中子暴露范围内(高达约8 * 10 / sup 14 / n / cm / sup 2 /),主要机理是通过以下方式去除载流子:总体损害程度适中;对于较大的中子暴露,其主要机理是载流子迁移率的降低,其破坏作用十分明显。建议中子诱发的损害的一部分可能以位移缺陷的形式保持潜在状态,而不会俘获电荷载体。用相同的中子注量和伽马射线剂量辐照的两个相同设备组的后续结果,除了中子/伽马射线的暴露顺序颠倒之外,都显示出这种协同作用。

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