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Displacement damage effects on the forward bias characteristics of SiC Schottky barrier power diodes

机译:位移损伤对SiC肖特基势垒功率二极管正向偏置特性的影响

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摘要

Commercial SiC Schottky barrier power diodes have been subjected to 203 MeV proton irradiation and the effects of the resultant displacement damage on the I-V characteristics have been observed. The diodes show excellent resistance to radiation damage. Changes in forward and reverse bias I-V characteristics are reported for irradiated 4H SiC commercial Schottky barrier diodes at fluences up to 2.5/spl times/10/sup 14/ p/cm/sup 2/. Small changes are seen in the reverse bias I-V characteristics with the reverse leakage actually decreasing with increasing irradiation fluence. In forward bias, the series resistance is observed to increase as the fluence increases. The changes in series resistance are interpreted as being due to changes in the effective dopant density due to carrier removal by the defects produced.
机译:商用SiC肖特基势垒功率二极管已受到203 MeV质子辐照,并观察到由此产生的位移损伤对I-V特性的影响。二极管具有出色的抗辐射损伤能力。报告了辐照的4H SiC商业肖特基势垒二极管的正向和反向偏置I-V特性的变化,注量最高可达2.5 / spl次/ 10 / sup 14 / p / cm / sup 2 /。反向偏压I-V特性出现很小的变化,反向泄漏实际上随着辐照通量的增加而减小。在正向偏置中,观察到串联电阻随注量的增加而增加。串联电阻的变化被解释为由于有效载流子密度的变化,有效掺杂剂密度的变化是由于所产生的缺陷去除了载流子。

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