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Single Event Upset and Multiple Cell Upset Modeling in Commercial Bulk 65-nm CMOS SRAMs and Flip-Flops

机译:商业批量65nm CMOS SRAM和触发器中的单事件翻转和多单元翻转建模

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摘要

A proprietary Monte-Carlo simulation code dedicated to heavy ion cross-section prediction has been developed. The code is based on diffusion-collection equations, takes into account recombination processes, uses an improved drain strike model, and includes new upset analysis algorithms for different circuit architectures. Simulated cross-sections are compared to heavy ion experimental characterizations for commercial bulk 65-nm single- and dual-port SRAMs. Simulation capabilities of much more complex circuits are demonstrated considering a 65-nm radiation-hardened-by-design (RHBD) Flip-Flop (FF).
机译:已经开发了专用于重离子横截面预测的专有蒙特卡洛模拟代码。该代码基于扩散-收集方程式,考虑了重组过程,使用了改进的漏极放电模型,并包括针对不同电路架构的新的不正常分析算法。将模拟横截面与商用65nm单块和双端口SRAM的重离子实验特性进行了比较。考虑到65nm辐射硬化设计(RHBD)触发器(FF),展示了更复杂电路的仿真功能。

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