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首页> 外文期刊>Nuclear Science, IEEE Transactions on >Single-Event Transient and Total Dose Response of Precision Voltage Reference Circuits Designed in a 90-nm SiGe BiCMOS Technology
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Single-Event Transient and Total Dose Response of Precision Voltage Reference Circuits Designed in a 90-nm SiGe BiCMOS Technology

机译:采用90nm SiGe BiCMOS技术设计的精密电压基准电路的单事件瞬态和总剂量响应

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摘要

This paper presents an investigation of the impact of single-event transients (SETs) and total ionization dose (TID) on precision voltage reference circuits designed in a fourth-generation, 90-nm SiGe BiCMOS technology. A first-order uncompensated bandgap reference (BGR) circuit is used to benchmark the SET and TID responses of these voltage reference circuits (VRCs). Based on the first-order BGR radiation response, new circuit-level radiation-hardening-by-design (RHBD) techniques are proposed. An RHBD technique using inverse-mode (IM) transistors is demonstrated in a BGR circuit. In addition, a PIN diode VRC is presented as a potential SET and TID tolerant, circuit-level RHBD alternative.
机译:本文介绍了单事件瞬变(SET)和总电离剂量(TID)对采用第四代90 nm SiGe BiCMOS技术设计的精密电压基准电路的影响的研究。一阶无补偿带隙基准(BGR)电路用于基准测试这些电压基准电路(VRC)的SET和TID响应。基于一阶BGR辐射响应,提出了新的电路级设计辐射强化(RHBD)技术。在BGR电路中演示了使用反向模式(IM)晶体管的RHBD技术。此外,还提供了PIN二极管VRC作为可耐受SET和TID的电路级RHBD的替代方案。

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