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Evaluation of amorphous diamond-like carbon-nitrogen films as wear protective coatings on thin film media and thin film head sliders

机译:评价非晶态类金刚石碳氮膜作为薄膜介质和薄膜磁头滑块上的耐磨涂层

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摘要

As the magnetic data storage industry strives to achieve ultra-high recording densities requiring fly heights of less than one microinch, the tribology of the head-disk interface (HDI) is a limiting factor in disk drive design. Amorphous diamond-like-carbon (DLC) films have been the materials of choice for wear-protective coatings. Various amorphous DLC type coatings have been developed. The earliest DLC material was DC magnetron sputtered pure carbon films. Recent developments have produced C:H (hydrogenated-carbon) and C:N (carbon-nitrogen) films with greater wear-resistance than pure C film. Our intent is to describe and evaluate the wear-resistance performance of amorphous C:N films as wear-protective overcoats on thin film media and thin film sliders. Both C:H and C:N films have demonstrated superiority over DC magnetron sputtered pure carbon films. The bond character, microhardness, surface roughness features, and the physical nature of initial wear damage influence wear-resistance performance significantly. A recent report of nano-indentor measurements and wear-resistance performance confirmed the superiority of RF diode and DC magnetron Facing Target Sputtering (FTS) of thin C:N coatings over other DLC films.
机译:随着磁数据存储行业努力实现超高记录密度,要求飞行高度小于一微英寸,磁头-磁盘接口(HDI)的摩擦学是磁盘驱动器设计中的一个限制因素。非晶态类金刚石碳(DLC)膜已成为耐磨涂层的首选材料。已经开发了各种无定形DLC型涂料。最早的DLC材料是直流磁控溅射纯碳膜。最近的发展已经产生了具有比纯C膜更大的耐磨性的C:H(氢化碳)和C:N(碳氮)膜。我们的目的是描述和评估非晶态C:N薄膜的耐磨性能,该薄膜作为薄膜介质和薄膜滑块上的耐磨保护层。 C:H和C:N膜均已证明优于直流磁控溅射纯碳膜。粘结特性,显微硬度,表面粗糙度特征以及初始磨损损坏的物理性质会显着影响耐磨性能。纳米压头测量和耐磨性能的最新报告证实了薄C:N涂层的RF二极管和DC磁控管面对靶溅射(FTS)优于其他DLC膜。

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