Corrections to 'effect of ir content and sputtering conditions on unidirectional anisotropy of Ni-Fe/Mn-Ir films fabricated under the extremely clean sputtering process'

Yagami K.; Tsunoda M.

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Corrections to 'effect of ir content and sputtering conditions on unidirectional anisotropy of Ni-Fe/Mn-Ir films fabricated under the extremely clean sputtering process'

机译：对“ ir含量和溅射条件对在非常干净的溅射工艺中制备的Ni-Fe / Mn-Ir膜的单向各向异性的影响”的校正

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来源
《IEEE Transactions on Magnetics》 |2000年第3期|P.612-612|共1页
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Yagami K.; Tsunoda M.;
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正文语种 eng
中图分类磁性材料、铁氧体;
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入库时间 2022-08-17 13:06:14

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专利

1. Effect of Ir content and sputtering conditions on unidirectional anisotropy of Ni-Fe/Mn-Ir films fabricated under the extremely clean sputtering process [J] . Yagami K., Tsunoda M. IEEE Transactions on Magnetics . 1999,第5期

机译：Ir含量和溅射条件对在极干净溅射工艺下制备的Ni-Fe / Mn-Ir薄膜单向各向异性的影响
2. Extremely clean sputtering process and microstructural properties of Ni-Fe films fabricated by this process [J] . Okuyama K., Shimatsu T. IEEE Transactions on Magnetics . 1995,第6期

机译：极干净的溅射工艺和通过该工艺制造的镍铁薄膜的显微组织性能
3. Microstructure and giant magnetoresistance of Ag-Co films fabricated by means of an extremely clean sputtering process (comparied with Cu-Co films) [J] . M.Tsunoda, D.Takahashi 日本応用磁気学会誌 . 1999,第4a2期

机译：通过非常干净的溅射工艺（与Cu-Co膜相比）制造的Ag-Co膜的微观结构和巨大的磁阻
4. Effect of Ir content and sputtering conditions on unidirectional anisotropy of Ni-Fe/Mn-Ir films fabricated under the extremely clean sputtering process [C] . Yagami, K., Tsunoda, . 1999

机译：Ir含量和溅射条件对在极干净溅射工艺下制备的Ni-Fe / Mn-Ir薄膜单向各向异性的影响
5. Thin-Film Transistors Fabricated Using Sputter Deposition of Zinc Oxide. [D] . Xiao, Nan. 2013

机译：使用溅射沉积氧化锌制造的薄膜晶体管。
6. High-quality thulium iron garnet films with tunable perpendicular magnetic anisotropy by off-axis sputtering – correlation between magnetic properties and film strain [O] . C. N. Wu, C. C. Tseng, Y. T. Fanchiang, -1

机译：通过离轴溅射可调节垂直磁各向异性的高质量th铁石榴石薄膜–磁性和薄膜应变之间的关系
7. Microstructure and Giant Magnetoresistance of Ag-Co Films Fabricated by Means of an Extremely Clean Sputtering Process. Comparied with Cu-Co Films. [O] . M. Tsunoda, D. Takahashi, H. Okahara, 1999

机译：通过极清洁的溅射工艺制造的Ag-Co膜的微观结构和巨磁阻。与Cu-Co膜比较。

Corrections to 'effect of ir content and sputtering conditions on unidirectional anisotropy of Ni-Fe/Mn-Ir films fabricated under the extremely clean sputtering process'

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