首页> 外文期刊>Device and Materials Reliability, IEEE Transactions on >High- PFET DC Hot-Carrier Mechanism and Its Relation to AC Degradation
【24h】

High- PFET DC Hot-Carrier Mechanism and Its Relation to AC Degradation

机译:高PFET直流热载流机制及其与交流衰减的关系

获取原文

摘要

Recently, negative bias temperature instability (NBTI) enhanced by local self-heating has been proposed as a mechanism for high-Vg PFET ¿hot-carrier¿ degradation. This is based on the idea that the effective temperature for NBTI is increased in the drain region due to a very localized self-heating effect reported in the literature by Pop and others. Our PFET dc stress data are consistent with local self-heating activated NBTI at high Vg , but at mid Vg, we observed similar behavior to typical NFET hot carriers, i.e., energy-driven hot carrier (EDHC). If self-heating is involved with the PFET high-Vg dc degradation, the question of ac behavior naturally arises. Our PFET ring-oscillator stress results demonstrate that the high-VGS PFET hot carrier dominant under dc stress does not significantly contribute under typical CMOS switching conditions, whereas the mid-VGS hot carrier does. This supports the idea that the predominant damage mechanism involved at high VGS is NBTI enhanced by local self-heating with a thermal time constant longer than a few hundred picoseconds.
机译:最近,由局部自热增强的负偏压温度不稳定性(NBTI)已被提出作为一种高Vg PFETγ,热载子γ降解的机制。这是基于这样的想法:由于Pop等人在文献中报道了非常局部的自热效应,因此NBTI的有效温度在漏极区域增加了。我们的PFET直流应力数据与高Vg时的局部自热激活NBTI一致,但是在中Vg时,我们观察到了与典型NFET热载流子(即能量驱动热载流子(EDHC))类似的行为。如果PFET高Vg直流降级涉及自热,自然会出现交流行为的问题。我们的PFET环形振荡器应力结果表明,在典型的CMOS开关条件下,在直流应力下占主导地位的高VGS PFET热载流子没有明显贡献,而中VGS热载流子却发挥了重要作用。这支持了这样的想法,即高VGS所涉及的主要损坏机制是通过局部自加热增强的NBTI,而热时间常数大于数百皮秒。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号