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The Impact of the Electrode Performance on the Endurance Properties of the Phase Change Memory Device

机译:电极性能对相变存储器件耐久性能的影响

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摘要

The cycle operation was performed on 1325 phase change memory (PCM) cells, and 4% of these cells could not be RESET to the high-resistance state after 106 cycles. The grown grains have been found in the TEM images, and the heat electron contact (HEC) has laterally diffused. The energy-dispersive X-ray spectroscopy profiles of HEC expound that Si and O elements have both multiplied. Thus, the HEC resistance has increased, resulting in insufficient RESET current. According to measurement, the HEC resistance increased from 4.6 to 7.2 K Omega after 106 cycles, which would decrease the RESET current from 0.7 to 0.45 mA. Compared with the endurance characteristics of the HEC and PCM device, the PCM device, with an increased HEC resistance, cannot be fully operated. When the HEC resistance is large enough to reduce the RESET current to 0.55 mA, the PCM device would be stuck to set.
机译:在1325个相变存储(PCM)单元上执行了循环操作,并且在106个循环后无法将其中4%的单元复位到高电阻状态。在TEM图像中发现了生长的晶粒,并且热电子接触(HEC)已横向扩散。 HEC的能量色散X射线光谱图表明Si和O元素都成倍增加。因此,HEC电阻增加,导致复位电流不足。根据测量,HEC电阻在106个周期后从4.6 KΩ增加到7.2 K Omega,这会将RESET电流从0.7 mA降低到0.45 mA。与HEC和PCM设备的耐用性相比,具有增加的HEC电阻的PCM设备无法完全运行。当HEC电阻足够大以将RESET电流减小到0.55 mA时,PCM设备将被卡住以进行设置。

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    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China|Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Nanotechnol Lab, Shanghai 200050, Peoples R China|Univ Chinese Acad Sci, State Key Lab Funct Mat Informat & Nanotechnol, Beijing 100080, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China|Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Nanotechnol Lab, Shanghai 200050, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China|Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Nanotechnol Lab, Shanghai 200050, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China|Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Nanotechnol Lab, Shanghai 200050, Peoples R China|Univ Chinese Acad Sci, State Key Lab Funct Mat Informat & Nanotechnol, Beijing 100080, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China|Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Nanotechnol Lab, Shanghai 200050, Peoples R China|Univ Chinese Acad Sci, State Key Lab Funct Mat Informat & Nanotechnol, Beijing 100080, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China|Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Nanotechnol Lab, Shanghai 200050, Peoples R China|Univ Chinese Acad Sci, State Key Lab Funct Mat Informat & Nanotechnol, Beijing 100080, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China|Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Nanotechnol Lab, Shanghai 200050, Peoples R China|Univ Chinese Acad Sci, State Key Lab Funct Mat Informat & Nanotechnol, Beijing 100080, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China|Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Nanotechnol Lab, Shanghai 200050, Peoples R China|Univ Chinese Acad Sci, State Key Lab Funct Mat Informat & Nanotechnol, Beijing 100080, Peoples R China;

    Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China|Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Nanotechnol Lab, Shanghai 200050, Peoples R China;

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  • 正文语种 eng
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  • 关键词

    Phase change memory; endurance; electrode; SET_Stuck;

    机译:相变存储器;耐久性;电极;set_stuck;

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